The GaN Substrate Defect Inspection System uses non-destructive optical inspection to identify and characterize defects in gallium nitride (GaN) substrates, supporting material quality evaluation and process development. Compatible with 2-, 4-, and 6-inch GaN substrates, the system detects a range of defects, including threading dislocations, stacking faults, inversion domains, grain boundaries, V-pits, voids, and cracks, helping users understand defect types and their distribution across the substrate.
The system offers a customizable, expandable detection suite that can be configured for specific material characteristics and inspection requirements. Joint development and application collaboration extend its capabilities to address new and complex defect types, supporting evolving needs in GaN materials research and inspection.
The system offers a customizable, expandable detection suite that can be configured for specific material characteristics and inspection requirements. Joint development and application collaboration extend its capabilities to address new and complex defect types, supporting evolving needs in GaN materials research and inspection.
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