SR-9000 Super-Resolution Detection System for SiC EPI-Wafers and Devices
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Transient Absorption Series

The SR-9000 is designed to address the defect inspection requirements of SiC epitaxial wafers and chips. It targets the current limitation in epitaxial wafer inspection, where precise quantification and spatial distribution of TSD and TED defects are difficult to obtain. Through high-precision detection, the system enables accurate identification and localization of TSD defects in SiC epitaxy and chips, providing critical support for further improvement of chip yield and performance.


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